High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism
- Авторы: Astapov A.1, Lifanov I.1, Prokofiev M.1
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Учреждения:
- Moscow Aviation Institute (National Research University)
- Выпуск: Том 2019, № 6 (2019)
- Страницы: 640-646
- Раздел: Hardening and Coating Technologies
- URL: https://journals.rcsi.science/0036-0295/article/view/173314
- DOI: https://doi.org/10.1134/S0036029519060065
- ID: 173314
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Аннотация
The physicochemical interaction in the ZrSi2–ZrSiO4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO2 phase. The mechanism and steps of the interaction processes are proposed.
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Об авторах
A. Astapov
Moscow Aviation Institute (National Research University)
Автор, ответственный за переписку.
Email: Lexxa1985@inbox.ru
Россия, Moscow, 125993
I. Lifanov
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Россия, Moscow, 125993
M. Prokofiev
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Россия, Moscow, 125993
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