High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism


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The physicochemical interaction in the ZrSi2–ZrSiO4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO2 phase. The mechanism and steps of the interaction processes are proposed.

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A. Astapov

Moscow Aviation Institute (National Research University)

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Email: Lexxa1985@inbox.ru
俄罗斯联邦, Moscow, 125993

I. Lifanov

Moscow Aviation Institute (National Research University)

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俄罗斯联邦, Moscow, 125993

M. Prokofiev

Moscow Aviation Institute (National Research University)

Email: Lexxa1985@inbox.ru
俄罗斯联邦, Moscow, 125993


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