High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism
- Autores: Astapov A.1, Lifanov I.1, Prokofiev M.1
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Afiliações:
- Moscow Aviation Institute (National Research University)
- Edição: Volume 2019, Nº 6 (2019)
- Páginas: 640-646
- Seção: Hardening and Coating Technologies
- URL: https://journals.rcsi.science/0036-0295/article/view/173314
- DOI: https://doi.org/10.1134/S0036029519060065
- ID: 173314
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Resumo
The physicochemical interaction in the ZrSi2–ZrSiO4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO2 phase. The mechanism and steps of the interaction processes are proposed.
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Sobre autores
A. Astapov
Moscow Aviation Institute (National Research University)
Autor responsável pela correspondência
Email: Lexxa1985@inbox.ru
Rússia, Moscow, 125993
I. Lifanov
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Rússia, Moscow, 125993
M. Prokofiev
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Rússia, Moscow, 125993
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