Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method
- 作者: An V.1, Pogrebenkov V.1, Zakharov A.2
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隶属关系:
- Tomsk Polytechnic University
- Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
- 期: 卷 8, 编号 1 (2017)
- 页面: 166-171
- 栏目: Article
- URL: https://journals.rcsi.science/2075-1133/article/view/206174
- DOI: https://doi.org/10.1134/S207511331701004X
- ID: 206174
如何引用文章
详细
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.
作者简介
V. An
Tomsk Polytechnic University
编辑信件的主要联系方式.
Email: an_vladimir@tpu.ru
俄罗斯联邦, Tomsk
V. Pogrebenkov
Tomsk Polytechnic University
Email: an_vladimir@tpu.ru
俄罗斯联邦, Tomsk
A. Zakharov
Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
Email: an_vladimir@tpu.ru
俄罗斯联邦, Tomsk