Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method
- Авторлар: An V.V.1, Pogrebenkov V.M.1, Zakharov A.N.2
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Мекемелер:
- Tomsk Polytechnic University
- Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
- Шығарылым: Том 8, № 1 (2017)
- Беттер: 166-171
- Бөлім: Article
- URL: https://journals.rcsi.science/2075-1133/article/view/206174
- DOI: https://doi.org/10.1134/S207511331701004X
- ID: 206174
Дәйексөз келтіру
Аннотация
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.
Негізгі сөздер
Авторлар туралы
V. An
Tomsk Polytechnic University
Хат алмасуға жауапты Автор.
Email: an_vladimir@tpu.ru
Ресей, Tomsk
V. Pogrebenkov
Tomsk Polytechnic University
Email: an_vladimir@tpu.ru
Ресей, Tomsk
A. Zakharov
Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
Email: an_vladimir@tpu.ru
Ресей, Tomsk
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