Enviar artigo por via de e-mail Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method
- Autores: An V.V.1, Pogrebenkov V.M.1, Zakharov A.N.2
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Afiliações:
- Tomsk Polytechnic University
- Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
- Edição: Volume 8, Nº 1 (2017)
- Páginas: 166-171
- Seção: Article
- URL: https://journals.rcsi.science/2075-1133/article/view/206174
- DOI: https://doi.org/10.1134/S207511331701004X
- ID: 206174
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This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.
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Sobre autores
V. An
Tomsk Polytechnic University
Autor responsável pela correspondência
Email: an_vladimir@tpu.ru
Rússia, Tomsk
V. Pogrebenkov
Tomsk Polytechnic University
Email: an_vladimir@tpu.ru
Rússia, Tomsk
A. Zakharov
Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
Email: an_vladimir@tpu.ru
Rússia, Tomsk
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