Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method
- Authors: An V.V.1, Pogrebenkov V.M.1, Zakharov A.N.2
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Affiliations:
- Tomsk Polytechnic University
- Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
- Issue: Vol 8, No 1 (2017)
- Pages: 166-171
- Section: Article
- URL: https://journals.rcsi.science/2075-1133/article/view/206174
- DOI: https://doi.org/10.1134/S207511331701004X
- ID: 206174
Cite item
Abstract
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.
About the authors
V. V. An
Tomsk Polytechnic University
Author for correspondence.
Email: an_vladimir@tpu.ru
Russian Federation, Tomsk
V. M. Pogrebenkov
Tomsk Polytechnic University
Email: an_vladimir@tpu.ru
Russian Federation, Tomsk
A. N. Zakharov
Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
Email: an_vladimir@tpu.ru
Russian Federation, Tomsk