Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method
- Авторы: An V.V.1, Pogrebenkov V.M.1, Zakharov A.N.2
-
Учреждения:
- Tomsk Polytechnic University
- Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
- Выпуск: Том 8, № 1 (2017)
- Страницы: 166-171
- Раздел: Article
- URL: https://journals.rcsi.science/2075-1133/article/view/206174
- DOI: https://doi.org/10.1134/S207511331701004X
- ID: 206174
Цитировать
Аннотация
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.
Ключевые слова
Об авторах
V. An
Tomsk Polytechnic University
Автор, ответственный за переписку.
Email: an_vladimir@tpu.ru
Россия, Tomsk
V. Pogrebenkov
Tomsk Polytechnic University
Email: an_vladimir@tpu.ru
Россия, Tomsk
A. Zakharov
Institute of High Current Electronics, Tomsk Scientific Center, Siberian Branch
Email: an_vladimir@tpu.ru
Россия, Tomsk
Дополнительные файлы
