Отправить статью по E-mail Near Field Formation via Colloid Particles in Problems of Nanoprocessing Silicon Substrates
- Авторы: Eremin Y.1, Sveshnikov A.2
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Учреждения:
- Department of Computational Mathematics and Cybernetics
- Department of Physics
- Выпуск: Том 10, № 1 (2018)
- Страницы: 36-44
- Раздел: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202059
- DOI: https://doi.org/10.1134/S2070048218010040
- ID: 202059
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Аннотация
A mathematical model for the analysis of the near field intensity distribution in problems of light scattering by particles on the substrate is developed based on the Discrete Sources Method. The influence of the size and material of the particles and the refractive index of the ambient medium on the distribution of the field intensity inside the substrate near the particle is examined.
Об авторах
Yu. Eremin
Department of Computational Mathematics and Cybernetics
Автор, ответственный за переписку.
Email: eremin@cs.msu.ru
Россия, Moscow
A. Sveshnikov
Department of Physics
Email: eremin@cs.msu.ru
Россия, Moscow
