Мақаланы E-mail арқылы жіберу Near Field Formation via Colloid Particles in Problems of Nanoprocessing Silicon Substrates
- Авторлар: Eremin Y.1, Sveshnikov A.2
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Мекемелер:
- Department of Computational Mathematics and Cybernetics
- Department of Physics
- Шығарылым: Том 10, № 1 (2018)
- Беттер: 36-44
- Бөлім: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202059
- DOI: https://doi.org/10.1134/S2070048218010040
- ID: 202059
Дәйексөз келтіру
Ашық рұқсат
Рұқсат берілді
Тек жазылушылар үшін
Аннотация
A mathematical model for the analysis of the near field intensity distribution in problems of light scattering by particles on the substrate is developed based on the Discrete Sources Method. The influence of the size and material of the particles and the refractive index of the ambient medium on the distribution of the field intensity inside the substrate near the particle is examined.
Авторлар туралы
Yu. Eremin
Department of Computational Mathematics and Cybernetics
Хат алмасуға жауапты Автор.
Email: eremin@cs.msu.ru
Ресей, Moscow
A. Sveshnikov
Department of Physics
Email: eremin@cs.msu.ru
Ресей, Moscow
