Email this article Near Field Formation via Colloid Particles in Problems of Nanoprocessing Silicon Substrates
- Authors: Eremin Y.A.1, Sveshnikov A.G.2
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Affiliations:
- Department of Computational Mathematics and Cybernetics
- Department of Physics
- Issue: Vol 10, No 1 (2018)
- Pages: 36-44
- Section: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202059
- DOI: https://doi.org/10.1134/S2070048218010040
- ID: 202059
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Abstract
A mathematical model for the analysis of the near field intensity distribution in problems of light scattering by particles on the substrate is developed based on the Discrete Sources Method. The influence of the size and material of the particles and the refractive index of the ambient medium on the distribution of the field intensity inside the substrate near the particle is examined.
About the authors
Yu. A. Eremin
Department of Computational Mathematics and Cybernetics
Author for correspondence.
Email: eremin@cs.msu.ru
Russian Federation, Moscow
A. G. Sveshnikov
Department of Physics
Email: eremin@cs.msu.ru
Russian Federation, Moscow
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