Near Field Formation via Colloid Particles in Problems of Nanoprocessing Silicon Substrates
- 作者: Eremin Y.1, Sveshnikov A.2
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隶属关系:
- Department of Computational Mathematics and Cybernetics
- Department of Physics
- 期: 卷 10, 编号 1 (2018)
- 页面: 36-44
- 栏目: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202059
- DOI: https://doi.org/10.1134/S2070048218010040
- ID: 202059
如何引用文章
详细
A mathematical model for the analysis of the near field intensity distribution in problems of light scattering by particles on the substrate is developed based on the Discrete Sources Method. The influence of the size and material of the particles and the refractive index of the ambient medium on the distribution of the field intensity inside the substrate near the particle is examined.
作者简介
Yu. Eremin
Department of Computational Mathematics and Cybernetics
编辑信件的主要联系方式.
Email: eremin@cs.msu.ru
俄罗斯联邦, Moscow
A. Sveshnikov
Department of Physics
Email: eremin@cs.msu.ru
俄罗斯联邦, Moscow