Orientation-patterned templates GaAs/Ge/GaAs for nonlinear optical devices. I. Molecular beam epitaxy
- Authors: Kazakov I.P.1, Tsekhosh V.I.1, Bazalevsky M.A.1, Klekovkin A.V.1
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Affiliations:
- Lebedev Physical Institute
- Issue: Vol 44, No 7 (2017)
- Pages: 187-191
- Section: Article
- URL: https://journals.rcsi.science/1068-3356/article/view/228389
- DOI: https://doi.org/10.3103/S1068335617070016
- ID: 228389
Cite item
Abstract
GaAs/Ge/GaAs heterostructures in which the GaAs layer lattice on Ge is rotated at a right angle to the substrate plane are grown by molecular-beam epitaxy (MBE). Such heterostructures are grown in different epitaxial setups for GaAs and for Ge with wafer transfer through air tor the first time. It is proposed to use surfactants (Bi, Sb) to control GaAs layer nucleation on Ge.
About the authors
I. P. Kazakov
Lebedev Physical Institute
Author for correspondence.
Email: kazakov@sci.lebedev.ru
Russian Federation, Leninskii pr. 53, Moscow, 119991
V. I. Tsekhosh
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Russian Federation, Leninskii pr. 53, Moscow, 119991
M. A. Bazalevsky
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Russian Federation, Leninskii pr. 53, Moscow, 119991
A. V. Klekovkin
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Russian Federation, Leninskii pr. 53, Moscow, 119991
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