Orientation-patterned templates GaAs/Ge/GaAs for nonlinear optical devices. I. Molecular beam epitaxy
- 作者: Kazakov I.P.1, Tsekhosh V.I.1, Bazalevsky M.A.1, Klekovkin A.V.1
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隶属关系:
- Lebedev Physical Institute
- 期: 卷 44, 编号 7 (2017)
- 页面: 187-191
- 栏目: Article
- URL: https://journals.rcsi.science/1068-3356/article/view/228389
- DOI: https://doi.org/10.3103/S1068335617070016
- ID: 228389
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详细
GaAs/Ge/GaAs heterostructures in which the GaAs layer lattice on Ge is rotated at a right angle to the substrate plane are grown by molecular-beam epitaxy (MBE). Such heterostructures are grown in different epitaxial setups for GaAs and for Ge with wafer transfer through air tor the first time. It is proposed to use surfactants (Bi, Sb) to control GaAs layer nucleation on Ge.
作者简介
I. Kazakov
Lebedev Physical Institute
编辑信件的主要联系方式.
Email: kazakov@sci.lebedev.ru
俄罗斯联邦, Leninskii pr. 53, Moscow, 119991
V. Tsekhosh
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
俄罗斯联邦, Leninskii pr. 53, Moscow, 119991
M. Bazalevsky
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
俄罗斯联邦, Leninskii pr. 53, Moscow, 119991
A. Klekovkin
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
俄罗斯联邦, Leninskii pr. 53, Moscow, 119991
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