Orientation-patterned templates GaAs/Ge/GaAs for nonlinear optical devices. I. Molecular beam epitaxy
- Авторлар: Kazakov I.P.1, Tsekhosh V.I.1, Bazalevsky M.A.1, Klekovkin A.V.1
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Мекемелер:
- Lebedev Physical Institute
- Шығарылым: Том 44, № 7 (2017)
- Беттер: 187-191
- Бөлім: Article
- URL: https://journals.rcsi.science/1068-3356/article/view/228389
- DOI: https://doi.org/10.3103/S1068335617070016
- ID: 228389
Дәйексөз келтіру
Аннотация
GaAs/Ge/GaAs heterostructures in which the GaAs layer lattice on Ge is rotated at a right angle to the substrate plane are grown by molecular-beam epitaxy (MBE). Such heterostructures are grown in different epitaxial setups for GaAs and for Ge with wafer transfer through air tor the first time. It is proposed to use surfactants (Bi, Sb) to control GaAs layer nucleation on Ge.
Негізгі сөздер
Авторлар туралы
I. Kazakov
Lebedev Physical Institute
Хат алмасуға жауапты Автор.
Email: kazakov@sci.lebedev.ru
Ресей, Leninskii pr. 53, Moscow, 119991
V. Tsekhosh
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Ресей, Leninskii pr. 53, Moscow, 119991
M. Bazalevsky
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Ресей, Leninskii pr. 53, Moscow, 119991
A. Klekovkin
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Ресей, Leninskii pr. 53, Moscow, 119991
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