Orientation-patterned templates GaAs/Ge/GaAs for nonlinear optical devices. I. Molecular beam epitaxy
- Autores: Kazakov I.P.1, Tsekhosh V.I.1, Bazalevsky M.A.1, Klekovkin A.V.1
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Afiliações:
- Lebedev Physical Institute
- Edição: Volume 44, Nº 7 (2017)
- Páginas: 187-191
- Seção: Article
- URL: https://journals.rcsi.science/1068-3356/article/view/228389
- DOI: https://doi.org/10.3103/S1068335617070016
- ID: 228389
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Resumo
GaAs/Ge/GaAs heterostructures in which the GaAs layer lattice on Ge is rotated at a right angle to the substrate plane are grown by molecular-beam epitaxy (MBE). Such heterostructures are grown in different epitaxial setups for GaAs and for Ge with wafer transfer through air tor the first time. It is proposed to use surfactants (Bi, Sb) to control GaAs layer nucleation on Ge.
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Sobre autores
I. Kazakov
Lebedev Physical Institute
Autor responsável pela correspondência
Email: kazakov@sci.lebedev.ru
Rússia, Leninskii pr. 53, Moscow, 119991
V. Tsekhosh
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Rússia, Leninskii pr. 53, Moscow, 119991
M. Bazalevsky
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Rússia, Leninskii pr. 53, Moscow, 119991
A. Klekovkin
Lebedev Physical Institute
Email: kazakov@sci.lebedev.ru
Rússia, Leninskii pr. 53, Moscow, 119991
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