Synthesis of photo and thermosetting monomers and polymers based on benzocyclobutene
- 作者: Levchenko K.1, Chudov K.1, Demin D.2, Adamov G.2, Poroshin N.1, Shmelin P.2, Grebennikov E.2, Chvalun S.1, Zubov V.1
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隶属关系:
- MIREA – Russian Technological University
- Central Technological Research Institute “Tehnomash”
- 期: 卷 68, 编号 7 (2019)
- 页面: 1321-1342
- 栏目: Reviews
- URL: https://journals.rcsi.science/1066-5285/article/view/243420
- DOI: https://doi.org/10.1007/s11172-019-2559-3
- ID: 243420
如何引用文章
详细
Modern approaches to the preparation of monomers and polymers based on benzocyclobutene are considered. The groups of polymers containing siloxane, silyl, polyfluorinated fragments, polyimides, polyamides, polyacrylates, polyolefins, and polyarylenes are distinguished among benzocyclobutene-containing polymers. The basic properties of these polymers (glass transition temperature, decomposition onset temperature, dielectric properties, moisture resistance) are described, and the possibility of their application in the creation of microelectronics devices is evaluated. It has been established that the dielectric constant of most known benzocyclobutene-based polymeric materials lies in the range from 2.3 to 3.07. Fluorine-containing and organosilicon derivatives show the best dielectric properties (2.3–2.38). Polysiloxanes possess the highest thermal stability between considered polymers, demonstrating stability up to 500–550 °C both in inert atmosphere and in air.
作者简介
K. Levchenko
MIREA – Russian Technological University
编辑信件的主要联系方式.
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 78, Moscow, 119454
K. Chudov
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 78, Moscow, 119454
D. Demin
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 4 ul. Ivana Franko, Moscow, 121108
G. Adamov
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 4 ul. Ivana Franko, Moscow, 121108
N. Poroshin
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 78, Moscow, 119454
P. Shmelin
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 4 ul. Ivana Franko, Moscow, 121108
E. Grebennikov
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 4 ul. Ivana Franko, Moscow, 121108
S. Chvalun
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 78, Moscow, 119454
V. Zubov
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
俄罗斯联邦, 78, Moscow, 119454