Synthesis of photo and thermosetting monomers and polymers based on benzocyclobutene
- Autores: Levchenko K.1, Chudov K.1, Demin D.2, Adamov G.2, Poroshin N.1, Shmelin P.2, Grebennikov E.2, Chvalun S.1, Zubov V.1
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Afiliações:
- MIREA – Russian Technological University
- Central Technological Research Institute “Tehnomash”
- Edição: Volume 68, Nº 7 (2019)
- Páginas: 1321-1342
- Seção: Reviews
- URL: https://journals.rcsi.science/1066-5285/article/view/243420
- DOI: https://doi.org/10.1007/s11172-019-2559-3
- ID: 243420
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Resumo
Modern approaches to the preparation of monomers and polymers based on benzocyclobutene are considered. The groups of polymers containing siloxane, silyl, polyfluorinated fragments, polyimides, polyamides, polyacrylates, polyolefins, and polyarylenes are distinguished among benzocyclobutene-containing polymers. The basic properties of these polymers (glass transition temperature, decomposition onset temperature, dielectric properties, moisture resistance) are described, and the possibility of their application in the creation of microelectronics devices is evaluated. It has been established that the dielectric constant of most known benzocyclobutene-based polymeric materials lies in the range from 2.3 to 3.07. Fluorine-containing and organosilicon derivatives show the best dielectric properties (2.3–2.38). Polysiloxanes possess the highest thermal stability between considered polymers, demonstrating stability up to 500–550 °C both in inert atmosphere and in air.
Sobre autores
K. Levchenko
MIREA – Russian Technological University
Autor responsável pela correspondência
Email: k.s.levchenko@gmail.com
Rússia, 78, Moscow, 119454
K. Chudov
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
Rússia, 78, Moscow, 119454
D. Demin
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
Rússia, 4 ul. Ivana Franko, Moscow, 121108
G. Adamov
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
Rússia, 4 ul. Ivana Franko, Moscow, 121108
N. Poroshin
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
Rússia, 78, Moscow, 119454
P. Shmelin
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
Rússia, 4 ul. Ivana Franko, Moscow, 121108
E. Grebennikov
Central Technological Research Institute “Tehnomash”
Email: k.s.levchenko@gmail.com
Rússia, 4 ul. Ivana Franko, Moscow, 121108
S. Chvalun
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
Rússia, 78, Moscow, 119454
V. Zubov
MIREA – Russian Technological University
Email: k.s.levchenko@gmail.com
Rússia, 78, Moscow, 119454