Synthesis of photo and thermosetting monomers and polymers based on benzocyclobutene

Abstract

Modern approaches to the preparation of monomers and polymers based on benzocyclobutene are considered. The groups of polymers containing siloxane, silyl, polyfluorinated fragments, polyimides, polyamides, polyacrylates, polyolefins, and polyarylenes are distinguished among benzocyclobutene-containing polymers. The basic properties of these polymers (glass transition temperature, decomposition onset temperature, dielectric properties, moisture resistance) are described, and the possibility of their application in the creation of microelectronics devices is evaluated. It has been established that the dielectric constant of most known benzocyclobutene-based polymeric materials lies in the range from 2.3 to 3.07. Fluorine-containing and organosilicon derivatives show the best dielectric properties (2.3–2.38). Polysiloxanes possess the highest thermal stability between considered polymers, demonstrating stability up to 500–550 °C both in inert atmosphere and in air.