Synthesis of photo and thermosetting monomers and polymers based on benzocyclobutene


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

Modern approaches to the preparation of monomers and polymers based on benzocyclobutene are considered. The groups of polymers containing siloxane, silyl, polyfluorinated fragments, polyimides, polyamides, polyacrylates, polyolefins, and polyarylenes are distinguished among benzocyclobutene-containing polymers. The basic properties of these polymers (glass transition temperature, decomposition onset temperature, dielectric properties, moisture resistance) are described, and the possibility of their application in the creation of microelectronics devices is evaluated. It has been established that the dielectric constant of most known benzocyclobutene-based polymeric materials lies in the range from 2.3 to 3.07. Fluorine-containing and organosilicon derivatives show the best dielectric properties (2.3–2.38). Polysiloxanes possess the highest thermal stability between considered polymers, demonstrating stability up to 500–550 °C both in inert atmosphere and in air.

Авторлар туралы

K. Levchenko

MIREA – Russian Technological University

Хат алмасуға жауапты Автор.
Email: k.s.levchenko@gmail.com
Ресей, 78, Moscow, 119454

K. Chudov

MIREA – Russian Technological University

Email: k.s.levchenko@gmail.com
Ресей, 78, Moscow, 119454

D. Demin

Central Technological Research Institute “Tehnomash”

Email: k.s.levchenko@gmail.com
Ресей, 4 ul. Ivana Franko, Moscow, 121108

G. Adamov

Central Technological Research Institute “Tehnomash”

Email: k.s.levchenko@gmail.com
Ресей, 4 ul. Ivana Franko, Moscow, 121108

N. Poroshin

MIREA – Russian Technological University

Email: k.s.levchenko@gmail.com
Ресей, 78, Moscow, 119454

P. Shmelin

Central Technological Research Institute “Tehnomash”

Email: k.s.levchenko@gmail.com
Ресей, 4 ul. Ivana Franko, Moscow, 121108

E. Grebennikov

Central Technological Research Institute “Tehnomash”

Email: k.s.levchenko@gmail.com
Ресей, 4 ul. Ivana Franko, Moscow, 121108

S. Chvalun

MIREA – Russian Technological University

Email: k.s.levchenko@gmail.com
Ресей, 78, Moscow, 119454

V. Zubov

MIREA – Russian Technological University

Email: k.s.levchenko@gmail.com
Ресей, 78, Moscow, 119454


© Springer Science+Business Media, LLC, part of Springer Nature, 2019

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