Deposition Process Optimization of Zinc Oxide Films with Inclined Texture Axis
- Authors: Luzanov V.A.1, Alekseev S.G.2, Polzikova N.I.2
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Affiliations:
- Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch)
- Kotel’nikov Institute of Radio Engineering and Electronics
- Issue: Vol 63, No 9 (2018)
- Pages: 1076-1079
- Section: Physical Processes in Electronic Devices
- URL: https://journals.rcsi.science/1064-2269/article/view/200191
- DOI: https://doi.org/10.1134/S1064226918090127
- ID: 200191
Cite item
Abstract
The optimization of technological parameters for fabrication of the inclined texture [0001] in ZnO films has been conducted. It is shown that the inclination of the texture axis is determined by at least two factors: the average vector of falling the deposited particles and the intensity of bombardment of the growing film with negative ions of oxygen. Optimum displacements of the substrate position relative to the axis of the sputtering system and the distance between the planes of the target and the substrate are determined. Films of zinc oxide with optimum angles of inclination of texture axis have been obtained by the RF sputtering technique.
About the authors
V. A. Luzanov
Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch)
Author for correspondence.
Email: valery@luzanov.ru
Russian Federation, Fryazino, Moscow oblast, 141190
S. G. Alekseev
Kotel’nikov Institute of Radio Engineering and Electronics
Email: valery@luzanov.ru
Russian Federation, Moscow, 125009
N. I. Polzikova
Kotel’nikov Institute of Radio Engineering and Electronics
Email: valery@luzanov.ru
Russian Federation, Moscow, 125009