Deposition Process Optimization of Zinc Oxide Films with Inclined Texture Axis
- 作者: Luzanov V.1, Alekseev S.2, Polzikova N.2
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隶属关系:
- Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch)
- Kotel’nikov Institute of Radio Engineering and Electronics
- 期: 卷 63, 编号 9 (2018)
- 页面: 1076-1079
- 栏目: Physical Processes in Electronic Devices
- URL: https://journals.rcsi.science/1064-2269/article/view/200191
- DOI: https://doi.org/10.1134/S1064226918090127
- ID: 200191
如何引用文章
详细
The optimization of technological parameters for fabrication of the inclined texture [0001] in ZnO films has been conducted. It is shown that the inclination of the texture axis is determined by at least two factors: the average vector of falling the deposited particles and the intensity of bombardment of the growing film with negative ions of oxygen. Optimum displacements of the substrate position relative to the axis of the sputtering system and the distance between the planes of the target and the substrate are determined. Films of zinc oxide with optimum angles of inclination of texture axis have been obtained by the RF sputtering technique.
作者简介
V. Luzanov
Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch)
编辑信件的主要联系方式.
Email: valery@luzanov.ru
俄罗斯联邦, Fryazino, Moscow oblast, 141190
S. Alekseev
Kotel’nikov Institute of Radio Engineering and Electronics
Email: valery@luzanov.ru
俄罗斯联邦, Moscow, 125009
N. Polzikova
Kotel’nikov Institute of Radio Engineering and Electronics
Email: valery@luzanov.ru
俄罗斯联邦, Moscow, 125009