Heterobarrier Varactors with Nonuniformly Doped Modulation Layers


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

Optimum shape of the capacitance–voltage (CV) characteristic is a critical parameter determining the efficiency of frequency multiplication in heterobarrier varactors (HBVs) operating in the millimeter and submillimeter frequency ranges. A numerical model for calculating the CV characteristics and leakage currents of HBV heterostructures with arbitrary composition and doping profiles has been verified on the basis of published and original experimental data. A specially designed HBV heterostructure with three undoped InAlAs/AlAs/InAlAs barriers surrounded by nonuniformly doped n-InGaAs modulation layers has been grown by molecular beam epitaxy on InP substrate. Prototype HBVs manufactured using the proposed heterostructure demonstrated a nearly cosine shape of the CV curve at bias voltages up to 2 V, increased overlap capacitance, and low leakage currents.

Авторлар туралы

N. Maleev

Ioffe Institute

Хат алмасуға жауапты Автор.
Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

M. Bobrov

Ioffe Institute

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

A. Kuzmenkov

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

A. Vasil’ev

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

M. Kulagina

Ioffe Institute

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

Yu. Guseva

Ioffe Institute

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

S. Blokhin

Ioffe Institute

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021

V. Ustinov

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences; Saint Petersburg Electrotechnical University “LETI”

Email: maleev@beam.ioffe.ru
Ресей, St. Petersburg, 194021; St. Petersburg, 197022


© Pleiades Publishing, Ltd., 2019

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