Heterobarrier Varactors with Nonuniformly Doped Modulation Layers


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Abstract

Optimum shape of the capacitance–voltage (CV) characteristic is a critical parameter determining the efficiency of frequency multiplication in heterobarrier varactors (HBVs) operating in the millimeter and submillimeter frequency ranges. A numerical model for calculating the CV characteristics and leakage currents of HBV heterostructures with arbitrary composition and doping profiles has been verified on the basis of published and original experimental data. A specially designed HBV heterostructure with three undoped InAlAs/AlAs/InAlAs barriers surrounded by nonuniformly doped n-InGaAs modulation layers has been grown by molecular beam epitaxy on InP substrate. Prototype HBVs manufactured using the proposed heterostructure demonstrated a nearly cosine shape of the CV curve at bias voltages up to 2 V, increased overlap capacitance, and low leakage currents.

About the authors

N. A. Maleev

Ioffe Institute

Author for correspondence.
Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

M. A. Bobrov

Ioffe Institute

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

A. G. Kuzmenkov

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

A. P. Vasil’ev

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

M. M. Kulagina

Ioffe Institute

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

Yu. A. Guseva

Ioffe Institute

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

S. A. Blokhin

Ioffe Institute

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021

V. M. Ustinov

Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences; Saint Petersburg Electrotechnical University “LETI”

Email: maleev@beam.ioffe.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 197022


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