电邮这篇文章 Composition, morphology, and electronic structure of the nanophases created on the SiO2 Surface by Ar+ ion bombardment
- 作者: Yusupjanova M.1, Tashmukhamedova D.1, Umirzakov B.1
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隶属关系:
- Tashkent State Technical University
- 期: 卷 61, 编号 4 (2016)
- 页面: 628-630
- 栏目: Short Communications
- URL: https://journals.rcsi.science/1063-7842/article/view/197114
- DOI: https://doi.org/10.1134/S1063784216040253
- ID: 197114
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详细
The influence of Ar+ bombardment on the composition and the structure of the SiO2/Si surface is studied. A thin Si film is found to form on the SiO2 surface subjected to high-dose ion bombardment.
作者简介
M. Yusupjanova
Tashkent State Technical University
编辑信件的主要联系方式.
Email: ftmet@rambler.ru
乌兹别克斯坦, ul. Universitetskaya 2, Tashkent, 100095
D. Tashmukhamedova
Tashkent State Technical University
Email: ftmet@rambler.ru
乌兹别克斯坦, ul. Universitetskaya 2, Tashkent, 100095
B. Umirzakov
Tashkent State Technical University
Email: ftmet@rambler.ru
乌兹别克斯坦, ul. Universitetskaya 2, Tashkent, 100095
