电邮这篇文章 The Effect of an N2 Additive on the GaAs Etching Rate in CF2Cl2 Plasma
- 作者: Pivovarenok S.1
-
隶属关系:
- Research Institute of Thermodynamics and Kinetics of Chemical Processes, Ivanovo State University of Chemistry and Technology
- 期: 卷 48, 编号 4 (2019)
- 页面: 236-239
- 栏目: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/187145
- DOI: https://doi.org/10.1134/S1063739719030089
- ID: 187145
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详细
The kinetics of GaAs etching in CF2Cl2 and CF2Cl2/N2 is investigated. It is shown that the shape of the dependences of the etching rate on the gas flow rate is determined by the energy of the ions bombarding the treated surface. It is demonstrated that, when a plasma-forming gas is diluted in a ratio of 1/1, the etching rate of the sample decreases by a factor of approximately 1.6. An increase in power (Wrf or Wbias) leads to significant changes in the GaAs etching rate.
作者简介
S. Pivovarenok
Research Institute of Thermodynamics and Kinetics of Chemical Processes,Ivanovo State University of Chemistry and Technology
编辑信件的主要联系方式.
Email: sap@isuct.ru
俄罗斯联邦, Ivanovo, 153000
