Ways of increasing the service life of positive photoresists
- Авторлар: Lebedev V.1, Kotomina V.1, Zelentsov S.1
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Мекемелер:
- Lobachevsky State University
- Шығарылым: Том 45, № 6 (2016)
- Беттер: 410-413
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/185802
- DOI: https://doi.org/10.1134/S1063739716060044
- ID: 185802
Дәйексөз келтіру
Аннотация
The change in the functional properties of positive photoresists during their storage is a serious issue in photolithography. The recovery of the functional properties of photoresists, and especially, the quality of the edge of the formed elements and changes in their sizes compared to the sizes in the photostencil, is possible by the introduction of additives into the composition of positive photoresists which form hydrogen bonds with the novolak resins constituting them prior to their usage. Experimental verification of the correlation between the density of the hydrogen bonds and the photoresist resolution has been obtained.
Авторлар туралы
V. Lebedev
Lobachevsky State University
Хат алмасуға жауапты Автор.
Email: 13virus@inbox.ru
Ресей, pr. Gagarina 23, GSP-20, Nizhny Novgorod, 603950
V. Kotomina
Lobachevsky State University
Email: 13virus@inbox.ru
Ресей, pr. Gagarina 23, GSP-20, Nizhny Novgorod, 603950
S. Zelentsov
Lobachevsky State University
Email: 13virus@inbox.ru
Ресей, pr. Gagarina 23, GSP-20, Nizhny Novgorod, 603950