Study of Ion Beam Including Deposition Modes of Platinum Nanosized Structures Using by Focused Ion Beams

Abstract

The results of experimental studies of the Pt structure with the thickness ranging from (0.48 ± 0.1) to (24.38 ± 0.1) nm ion beam including deposition by focused ion beam are presented. The rate of ion beam including deposition of Pt, which depending on the modes varies from (0.28 ± 0.02) to (6.7 ± 0.5) nm/s, is determined experimentally. The deviation of Pt lateral structure sizes from those preset by the template decreases from (29.3 ± 0.07)% to (2.4 ± 0.2)% depending on the deposition duration. By the thicknesses of Pt nanosized structures larger than 3 nm, their specific resistance amounts to (23.4 ± 1.8) Ohm cm and weakly depends on the thickness. The results can be used for developing the technological processes used to form the structures of microelectronics sensorics, nanoelectronics, and nano- and microsystem engineering.