Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering
- Авторлар: Pustovit A.N.1
-
Мекемелер:
- Institute of Microelectronics Technology and High Purity Materials
- Шығарылым: Том 82, № 2 (2018)
- Беттер: 145-149
- Бөлім: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/185299
- DOI: https://doi.org/10.3103/S106287381802020X
- ID: 185299
Дәйексөз келтіру
Аннотация
The dependences of the coefficient of self-sputtering on the type of accelerated ions, their energy, and the angle of incidence on a target are calculated. Satisfactory coincidence between the calculated and experimental results is obtained for С–С and W–W systems. Two mechanisms of the entry of secondary particles into a flow of sputtered atoms are proposed.
Авторлар туралы
A. Pustovit
Institute of Microelectronics Technology and High Purity Materials
Хат алмасуға жауапты Автор.
Email: pustan@ipmt-hpm.ac.ru
Ресей, Chernogolovka, Moscow oblast, 142432
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