电邮这篇文章 Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering
- 作者: Pustovit A.N.1
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隶属关系:
- Institute of Microelectronics Technology and High Purity Materials
- 期: 卷 82, 编号 2 (2018)
- 页面: 145-149
- 栏目: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/185299
- DOI: https://doi.org/10.3103/S106287381802020X
- ID: 185299
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详细
The dependences of the coefficient of self-sputtering on the type of accelerated ions, their energy, and the angle of incidence on a target are calculated. Satisfactory coincidence between the calculated and experimental results is obtained for С–С and W–W systems. Two mechanisms of the entry of secondary particles into a flow of sputtered atoms are proposed.
作者简介
A. Pustovit
Institute of Microelectronics Technology and High Purity Materials
编辑信件的主要联系方式.
Email: pustan@ipmt-hpm.ac.ru
俄罗斯联邦, Chernogolovka, Moscow oblast, 142432
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