Enviar artigo por via de e-mail Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering
- Autores: Pustovit A.N.1
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Afiliações:
- Institute of Microelectronics Technology and High Purity Materials
- Edição: Volume 82, Nº 2 (2018)
- Páginas: 145-149
- Seção: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/185299
- DOI: https://doi.org/10.3103/S106287381802020X
- ID: 185299
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Resumo
The dependences of the coefficient of self-sputtering on the type of accelerated ions, their energy, and the angle of incidence on a target are calculated. Satisfactory coincidence between the calculated and experimental results is obtained for С–С and W–W systems. Two mechanisms of the entry of secondary particles into a flow of sputtered atoms are proposed.
Sobre autores
A. Pustovit
Institute of Microelectronics Technology and High Purity Materials
Autor responsável pela correspondência
Email: pustan@ipmt-hpm.ac.ru
Rússia, Chernogolovka, Moscow oblast, 142432
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