Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering


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Abstract

Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.

About the authors

L. A. Leonova

Tomsk Polytechnic University

Email: boi5@list.ru
Russian Federation, Tomsk, 634050

E. L. Boytsova

Tomsk Polytechnic University

Author for correspondence.
Email: boi5@list.ru
Russian Federation, Tomsk, 634050

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