Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
- Authors: Leonova L.A.1, Boytsova E.L.1
-
Affiliations:
- Tomsk Polytechnic University
- Issue: Vol 82, No 9 (2018)
- Pages: 1143-1147
- Section: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/186182
- DOI: https://doi.org/10.3103/S1062873818090058
- ID: 186182
Cite item
Abstract
Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.
About the authors
L. A. Leonova
Tomsk Polytechnic University
Email: boi5@list.ru
Russian Federation, Tomsk, 634050
E. L. Boytsova
Tomsk Polytechnic University
Author for correspondence.
Email: boi5@list.ru
Russian Federation, Tomsk, 634050
Supplementary files
