Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
- Авторлар: Leonova L.A.1, Boytsova E.L.1
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Мекемелер:
- Tomsk Polytechnic University
- Шығарылым: Том 82, № 9 (2018)
- Беттер: 1143-1147
- Бөлім: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/186182
- DOI: https://doi.org/10.3103/S1062873818090058
- ID: 186182
Дәйексөз келтіру
Аннотация
Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.
Авторлар туралы
L. Leonova
Tomsk Polytechnic University
Email: boi5@list.ru
Ресей, Tomsk, 634050
E. Boytsova
Tomsk Polytechnic University
Хат алмасуға жауапты Автор.
Email: boi5@list.ru
Ресей, Tomsk, 634050
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