Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
- 作者: Leonova L.A.1, Boytsova E.L.1
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隶属关系:
- Tomsk Polytechnic University
- 期: 卷 82, 编号 9 (2018)
- 页面: 1143-1147
- 栏目: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/186182
- DOI: https://doi.org/10.3103/S1062873818090058
- ID: 186182
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详细
Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.
作者简介
L. Leonova
Tomsk Polytechnic University
Email: boi5@list.ru
俄罗斯联邦, Tomsk, 634050
E. Boytsova
Tomsk Polytechnic University
编辑信件的主要联系方式.
Email: boi5@list.ru
俄罗斯联邦, Tomsk, 634050
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