Vanadium- and Titanium Dioxide-Based Memristors Fabricated via Pulsed Laser Deposition


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Thin TiOx and VO2 – x films are fabricated via pulsed laser deposition from metal targets with the help of mask technologies. Their memristive properties are investigated using Au/TiOx1/TiOx2/Au and Au/VO2/VO2 – x/Au thin-film structures, and the possible mechanisms of resistive switching are discussed. The structures are obtained at room temperature in an oxygen atmosphere.

作者简介

O. Novodvorsky

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

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Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

L. Parshina

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

A. Lotin

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

V. Mikhalevsky

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

O. Khramova

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

E. Cherebylo

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

V. Panchenko

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
俄罗斯联邦, Shatura, 140700

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