Studying the Formation of Single-Layer Graphene on the Surface of SiC
- Авторы: Gushchina E.V.1, Dunaevskiy M.S.1, Lebedev S.P.1, Eliseev I.A.1, Lebedev A.A.1
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Учреждения:
- Ioffe Institute
- Выпуск: Том 13, № 3 (2019)
- Страницы: 395-399
- Раздел: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/196311
- DOI: https://doi.org/10.1134/S1027451019010099
- ID: 196311
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Аннотация
Regions of single-layer- and bilayer graphene on the surface of thermally processed 4H-SiC substrates are studied using Kelvin probe force microscopy and Raman spectroscopy. We establish experimentally the key parameters of the adopted graphene growth technique which enables the fraction of bilayer graphene to be reduced to a minimum, while samples with a fraction of single-layer graphene as high as 95% are obtained.
Об авторах
E. Gushchina
Ioffe Institute
Автор, ответственный за переписку.
Email: katgushch@yandex.ru
Россия, St. Petersburg, 194021
M. Dunaevskiy
Ioffe Institute
Email: katgushch@yandex.ru
Россия, St. Petersburg, 194021
S. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
Россия, St. Petersburg, 194021
I. Eliseev
Ioffe Institute
Email: katgushch@yandex.ru
Россия, St. Petersburg, 194021
A. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
Россия, St. Petersburg, 194021
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