Studying the Formation of Single-Layer Graphene on the Surface of SiC
- Авторлар: Gushchina E.V.1, Dunaevskiy M.S.1, Lebedev S.P.1, Eliseev I.A.1, Lebedev A.A.1
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Мекемелер:
- Ioffe Institute
- Шығарылым: Том 13, № 3 (2019)
- Беттер: 395-399
- Бөлім: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/196311
- DOI: https://doi.org/10.1134/S1027451019010099
- ID: 196311
Дәйексөз келтіру
Аннотация
Regions of single-layer- and bilayer graphene on the surface of thermally processed 4H-SiC substrates are studied using Kelvin probe force microscopy and Raman spectroscopy. We establish experimentally the key parameters of the adopted graphene growth technique which enables the fraction of bilayer graphene to be reduced to a minimum, while samples with a fraction of single-layer graphene as high as 95% are obtained.
Авторлар туралы
E. Gushchina
Ioffe Institute
Хат алмасуға жауапты Автор.
Email: katgushch@yandex.ru
Ресей, St. Petersburg, 194021
M. Dunaevskiy
Ioffe Institute
Email: katgushch@yandex.ru
Ресей, St. Petersburg, 194021
S. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
Ресей, St. Petersburg, 194021
I. Eliseev
Ioffe Institute
Email: katgushch@yandex.ru
Ресей, St. Petersburg, 194021
A. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
Ресей, St. Petersburg, 194021
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