Studying the Formation of Single-Layer Graphene on the Surface of SiC
- 作者: Gushchina E.V.1, Dunaevskiy M.S.1, Lebedev S.P.1, Eliseev I.A.1, Lebedev A.A.1
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隶属关系:
- Ioffe Institute
- 期: 卷 13, 编号 3 (2019)
- 页面: 395-399
- 栏目: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/196311
- DOI: https://doi.org/10.1134/S1027451019010099
- ID: 196311
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详细
Regions of single-layer- and bilayer graphene on the surface of thermally processed 4H-SiC substrates are studied using Kelvin probe force microscopy and Raman spectroscopy. We establish experimentally the key parameters of the adopted graphene growth technique which enables the fraction of bilayer graphene to be reduced to a minimum, while samples with a fraction of single-layer graphene as high as 95% are obtained.
作者简介
E. Gushchina
Ioffe Institute
编辑信件的主要联系方式.
Email: katgushch@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
M. Dunaevskiy
Ioffe Institute
Email: katgushch@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
S. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
I. Eliseev
Ioffe Institute
Email: katgushch@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
A. Lebedev
Ioffe Institute
Email: katgushch@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
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