Thermal stability, structure and phase composition of Nix(NbO)100–x composites

详细

The influence of heat treatment on the structure and electrical properties of Ni_x(NbO)_100–x thin films obtained by the ion-beam sputtering of a composite target is investigated. The composite structure is found to be formed during the deposition of Ni–NbO films and to contain a mixture of nanoscale face-centered cubic (fcc) Ni grains and amorphous niobium oxide. Annealing at 550°C leads to the crystallization of amorphous niobium oxide; however, the heterogeneity and nanoscale structure of composites are maintained.