Energy-dispersive dependences of the X-ray photoemission of electrons from implanted silicon


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The possibilities of interpreting the secondary-electron energy spectra and recording the X-ray photoemission of single-crystal silicon samples are examined. Detected shifts in the energy-spectrum extremum, as well as its height, and the entire energy-distribution form for different types of implanted and annealed Si samples, indicate the degree of ordering of surface atoms. The possibilities of employing the Friedel- oscillation model are discussed.

作者简介

I. Zeltser

Yesenin Ryazan State University

Email: e_moos@mail.ru
俄罗斯联邦, Ryazan, 390000

E. Moos

Yesenin Ryazan State University

编辑信件的主要联系方式.
Email: e_moos@mail.ru
俄罗斯联邦, Ryazan, 390000

O. Savushkin

Yesenin Ryazan State University

Email: e_moos@mail.ru
俄罗斯联邦, Ryazan, 390000

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