Creation of Calibrated Samples of a Measure with Relief Elements Less Than 100 nm


如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

Results from the development of an experimental sample of a measure with relief elements less than 100 nm for use in calibration of optical, near-field, and electron microscopes based on a metallized electronic resist (coating) are presented.

作者简介

Yu. Efimenkov

All-Russia Research Institute of Optophysical Measurements (VNIIOFI)

Email: izmt@vniims.ru
俄罗斯联邦, Moscow

Yu. Zolotarevskii

All-Russia Research Institute of Optophysical Measurements (VNIIOFI)

Email: izmt@vniims.ru
俄罗斯联邦, Moscow

V. Lyaskovskii

All-Russia Research Institute of Optophysical Measurements (VNIIOFI)

Email: izmt@vniims.ru
俄罗斯联邦, Moscow

K. Min’kov

All-Russia Research Institute of Optophysical Measurements (VNIIOFI)

Email: izmt@vniims.ru
俄罗斯联邦, Moscow

A. Samoilenko

All-Russia Research Institute of Optophysical Measurements (VNIIOFI)

Email: izmt@vniims.ru
俄罗斯联邦, Moscow

补充文件

附件文件
动作
1. JATS XML

版权所有 © Springer Science+Business Media New York, 2016