Chemical interaction of InAs, InSb, GaAs, and GaSb crystal surfaces with (NH4)2Cr2O7–HBr–citric acid etching solutions

Аннотация

We have studied the chemical dissolution of InAs, InSb, GaAs, and GaSb crystals in (NH₄)₂Cr₂O₇–HBr–C₆H₈O₇ solutions. The dissolution rate of the crystals has been measured as a function of etchant composition, and the kinetics of the chemical interaction of the semiconductors with solutions have been investigated in detail. The dissolution rate has been shown to be diffusion-limited. Citric acid helps to reduce the etch rate and improves the polishing performance of the etching solutions.