Tantalum chemical vapor deposition on substrates from various materials

O. Yu. Goncharov; S. Yu. Treshchev; V. I. Lad’yanov; R. R. Faizullin; V. N. Guskov; L. Kh. Baldaev

doi:10.1134/S0020168517100089

Tantalum chemical vapor deposition on substrates from various materials

作者: Goncharov O.Y.¹, Treshchev S.Y.¹, Lad’yanov V.I.¹, Faizullin R.R.², Guskov V.N.³, Baldaev L.K.⁴
隶属关系:
1. Physical-Technical Institute, Udmurt Scientific Center, Ural Branch
2. OOO Protective Coatings Research and Production Association
3. Kurnakov Institute of General and Inorganic Chemistry
4. OOO Technological Systems for Protective Coatings
期: 卷 53, 编号 10 (2017)
页面: 1064-1068
栏目: Article
URL: https://journals.rcsi.science/0020-1685/article/view/158306
DOI: https://doi.org/10.1134/S0020168517100089
ID: 158306

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Tantalum coatings have been produced for the first time by hydrogen-free chemical vapor deposition through reduction of tantalum pentabromide with cadmium vapor, which allowed the deposition temperature to be substantially reduced (by more than 200 K). The coatings consisted of α- and/or β-Ta, depending on the substrate material.