Enviar artigo por via de e-mail Tantalum chemical vapor deposition on substrates from various materials
- Autores: Goncharov O.Y.1, Treshchev S.Y.1, Lad’yanov V.I.1, Faizullin R.R.2, Guskov V.N.3, Baldaev L.K.4
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Afiliações:
- Physical-Technical Institute, Udmurt Scientific Center, Ural Branch
- OOO Protective Coatings Research and Production Association
- Kurnakov Institute of General and Inorganic Chemistry
- OOO Technological Systems for Protective Coatings
- Edição: Volume 53, Nº 10 (2017)
- Páginas: 1064-1068
- Seção: Article
- URL: https://journals.rcsi.science/0020-1685/article/view/158306
- DOI: https://doi.org/10.1134/S0020168517100089
- ID: 158306
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Resumo
Tantalum coatings have been produced for the first time by hydrogen-free chemical vapor deposition through reduction of tantalum pentabromide with cadmium vapor, which allowed the deposition temperature to be substantially reduced (by more than 200 K). The coatings consisted of α- and/or β-Ta, depending on the substrate material.
Sobre autores
O. Goncharov
Physical-Technical Institute, Udmurt Scientific Center, Ural Branch
Autor responsável pela correspondência
Email: olaf@nm.ru
Rússia, ul. Kirova 132, Izhevsk, 426000
S. Treshchev
Physical-Technical Institute, Udmurt Scientific Center, Ural Branch
Email: olaf@nm.ru
Rússia, ul. Kirova 132, Izhevsk, 426000
V. Lad’yanov
Physical-Technical Institute, Udmurt Scientific Center, Ural Branch
Email: olaf@nm.ru
Rússia, ul. Kirova 132, Izhevsk, 426000
R. Faizullin
OOO Protective Coatings Research and Production Association
Email: olaf@nm.ru
Rússia, pr. Lenina 142, Podolsk, Moscow oblast, 142100
V. Guskov
Kurnakov Institute of General and Inorganic Chemistry
Email: olaf@nm.ru
Rússia, Leninskii pr. 31, Moscow, 119991
L. Baldaev
OOO Technological Systems for Protective Coatings
Email: olaf@nm.ru
Rússia, Simferopol’skoe sh. 19, Shcherbinka, Moscow, 108852
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