EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

V. V. Chernik; Черник В. В.

doi:10.31857/S2686740023050036

EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

Autores: Chernik V.¹
Afiliações:
1. Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences
Edição: Volume 512, Nº 1 (2023)
Páginas: 44-50
Seção: ФИЗИКА
URL: https://journals.rcsi.science/2686-7400/article/view/232973
DOI: https://doi.org/10.31857/S2686740023050036
EDN: https://elibrary.ru/OWHLPJ
ID: 232973

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Resumo

The paper presents several statements of the problems of synthesis of holographic mask in the form of optimization problems for quality of holographic images. An effective algorithm for the synthesis of holographic masks based on FFT with complexity O(NlnN), where N is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS and high-end chips. Experimental results are presented.

Palavras-chave

diffraction, computer-generated holography, optimization problems, photolithography

Sobre autores

V. Chernik

Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences

Autor responsável pela correspondência
Email: gungho424@gmail.com
Russia, Moscow

Bibliografia

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Borisov M., Chernik V., Merkushov L., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors. MEMS/NEMS and MOEMS. 2020. XXXIV. 113241J (2020) https://doi.org/10.1117/12.2552013
Borisov M., Chernik V., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS. 2020. XXXIV; 1132417 (2020). https://doi.org/10.1117/12.2551936