EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

V. V. Chernik; Черник В. В.

doi:10.31857/S2686740023050036

EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

作者: Chernik V.¹
隶属关系:
1. Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences
期: 卷 512, 编号 1 (2023)
页面: 44-50
栏目: ФИЗИКА
URL: https://journals.rcsi.science/2686-7400/article/view/232973
DOI: https://doi.org/10.31857/S2686740023050036
EDN: https://elibrary.ru/OWHLPJ
ID: 232973

如何引用文章

全文:

开放存取

##reader.subscriptionAccessGranted##
受限制的访问

订阅存取

详细
作者简介
参考
补充文件
统计

详细

The paper presents several statements of the problems of synthesis of holographic mask in the form of optimization problems for quality of holographic images. An effective algorithm for the synthesis of holographic masks based on FFT with complexity O(NlnN), where N is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS and high-end chips. Experimental results are presented.

关键词

diffraction, computer-generated holography, optimization problems, photolithography

作者简介

V. Chernik

Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences

编辑信件的主要联系方式.
Email: gungho424@gmail.com
Russia, Moscow

参考

Борисов М.В., Боровиков В.А., Гавриков А.А., Князьков Д.Ю., Раховский В.И., Челюбеев Д.А., Шамаев А.С. Методы создания и коррекции качества голографических изображений геометрических объектов с элементами субволновых размеров // ДАН. 2010. Т. 434. № 3. С. 332–336.
Rakhovsky V., Knyazkov D., Shamaev A., Chernik V., Gavrikov A., Chelyubeev D., Mikheev P., Borisov M. // Proc. European Mask and Lithography Conference. SPIE. 2012. V. 8352. 83520P.
Черник В.В. // Журнал Радиоэлектроники. 2017. № 1. С. 1–20.
Gabor D.A. // Nature. 1948. № 161. P. 777–778.
Колфилд Г. Оптическая голография. М.: Мир, 1982. 376 с.
Mack C.A. Fundamental Principles of Optical Lithography: The Science of Microfabrication.: John Wiley & Sons, 2007. 417 p.
Басс Ф.Г., Фукс И.М. Рассеяние волн на статистически неровной поверхности. М.: Наука, 1972. 424 с.
Черник В.В. // Труды VI международной конференции “Параллельные вычисления и задачи управления”. PACO’2012. Т. II. 2012.
Михеев П.А. // Вестн. Моск. ун-та. Сер. 15: Вычислительная математика и кибернетика. 2014. Т. 1. С. 15–22.
Borisov M., Chernik V., Merkushov L., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors. MEMS/NEMS and MOEMS. 2020. XXXIV. 113241J (2020) https://doi.org/10.1117/12.2552013
Borisov M., Chernik V., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS. 2020. XXXIV; 1132417 (2020). https://doi.org/10.1117/12.2551936