Analysis of the Possibility of Independent Control of Various Plasma Parameters of an RF Non-Self-Sustained Plasma Discharge with Additional Ionization by an Electron Beam

This paper presents the study results of an RF non-self-sustained plasma discharge with additional ionization by electron beams. Using a complex experimental-theoretical approach it was shown that the parameters of such plasma differ from those of a conventional RF plasma as well as pure electron beam plasma. The study has confirmed that RF plasma with electron beam ionization can be used to obtain a lower electron temperature than in classical RF plasma and, accordingly, to obtain lower energy ions. RF non-self-sustained discharge plasma parameters can be controlled: plasma density – by varying the RF power at the discharge generation frequency; energy spectra of electrons and ions – by varying the contribution ratio of the RF power, the RF-bias power, and the electron beam power. The result obtained is also promising for the possibility of precision surface treatment with low ion energy plasma used in atomic layer etching and deposition technologies.