Thermal Stability and Hardness Studies of Ge Doped Se–Te Glassy Alloys
- Авторы: Vandita Rao 1, Singh P.K.1, Lohia P.2, Dwivedi D.K.1
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Учреждения:
- Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
- Department of Electronics and Communication Engineering M. M. M. University of Technology
- Выпуск: Том 45, № 6 (2019)
- Страницы: 459-466
- Раздел: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/217420
- DOI: https://doi.org/10.1134/S1087659619060178
- ID: 217420
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Аннотация
The amorphous glassy alloys Se82 – xTe18Gex (x = 0, 4, 8, 12, at %) was synthesized using melt quench technique. Thermal stability was examined with the help of various parameters such as Dietzal parameter, Hruby parameter, Saad and Poulin and Lu and Liu parameters. Vicker hardness was obtained from Vicker hardness tester and other related thermo-mechanical properties such as volume of micro-voids, energy formation of micro-voids and modulus of elasticity were calculated.
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Об авторах
Vandita Rao
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Индия, Gorakhpur, 273010
Pravin Singh
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Индия, Gorakhpur, 273010
Pooja Lohia
Department of Electronics and Communication Engineering M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Индия, Gorakhpur, 273010
D. Dwivedi
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Автор, ответственный за переписку.
Email: todkdwivedi@gmail.com
Индия, Gorakhpur, 273010
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