Enviar artigo por via de e-mail Thermal Stability and Hardness Studies of Ge Doped Se–Te Glassy Alloys
- Autores: Vandita Rao 1, Singh P.K.1, Lohia P.2, Dwivedi D.K.1
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Afiliações:
- Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
- Department of Electronics and Communication Engineering M. M. M. University of Technology
- Edição: Volume 45, Nº 6 (2019)
- Páginas: 459-466
- Seção: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/217420
- DOI: https://doi.org/10.1134/S1087659619060178
- ID: 217420
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Resumo
The amorphous glassy alloys Se82 – xTe18Gex (x = 0, 4, 8, 12, at %) was synthesized using melt quench technique. Thermal stability was examined with the help of various parameters such as Dietzal parameter, Hruby parameter, Saad and Poulin and Lu and Liu parameters. Vicker hardness was obtained from Vicker hardness tester and other related thermo-mechanical properties such as volume of micro-voids, energy formation of micro-voids and modulus of elasticity were calculated.
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Sobre autores
Vandita Rao
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Índia, Gorakhpur, 273010
Pravin Singh
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Índia, Gorakhpur, 273010
Pooja Lohia
Department of Electronics and Communication Engineering M. M. M. University of Technology
Email: todkdwivedi@gmail.com
Índia, Gorakhpur, 273010
D. Dwivedi
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Autor responsável pela correspondência
Email: todkdwivedi@gmail.com
Índia, Gorakhpur, 273010
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