电邮这篇文章 Thermal Stability and Hardness Studies of Ge Doped Se–Te Glassy Alloys
- 作者: Vandita Rao 1, Singh P.K.1, Lohia P.2, Dwivedi D.K.1
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隶属关系:
- Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
- Department of Electronics and Communication Engineering M. M. M. University of Technology
- 期: 卷 45, 编号 6 (2019)
- 页面: 459-466
- 栏目: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/217420
- DOI: https://doi.org/10.1134/S1087659619060178
- ID: 217420
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详细
The amorphous glassy alloys Se82 – xTe18Gex (x = 0, 4, 8, 12, at %) was synthesized using melt quench technique. Thermal stability was examined with the help of various parameters such as Dietzal parameter, Hruby parameter, Saad and Poulin and Lu and Liu parameters. Vicker hardness was obtained from Vicker hardness tester and other related thermo-mechanical properties such as volume of micro-voids, energy formation of micro-voids and modulus of elasticity were calculated.
作者简介
Vandita Rao
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
印度, Gorakhpur, 273010
Pravin Singh
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
Email: todkdwivedi@gmail.com
印度, Gorakhpur, 273010
Pooja Lohia
Department of Electronics and Communication Engineering M. M. M. University of Technology
Email: todkdwivedi@gmail.com
印度, Gorakhpur, 273010
D. Dwivedi
Amorphous Semiconductor Research Lab Department of Applied Science, M. M. M. University of Technology
编辑信件的主要联系方式.
Email: todkdwivedi@gmail.com
印度, Gorakhpur, 273010
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