X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering

Аннотация

The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.